Integration of GaAs /In0.1Ga0.9As/AlAs resonance tunneling heterostructures into micro-electro-mechanical systems for sensor applications
Identifieur interne : 000B17 ( Chine/Analysis ); précédent : 000B16; suivant : 000B18Integration of GaAs /In0.1Ga0.9As/AlAs resonance tunneling heterostructures into micro-electro-mechanical systems for sensor applications
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Abstract
Double-barrier quantum-well resonant tunneling heterostructures of GaAs/In0.1Ga0.9As/AlAs have been used as pressure-sensing elements of designed micro-electro-mechanical systems. The static experiments have been conducted on the heterostructure, in both positive and negative differential resistance (PDR and NDR) regions, showing a piezoresistive coefficient of 3.85 x 10-9 Pa-1, which is about seven times larger than that of piezoresistive silicon devices. At the same time, the devices also provided an improved dynamic response (119.6 μV . g-1 V-1) and signal-to-noise ratio (57 dB) in the NDR region.
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Pascal:10-0144070Le document en format XML
<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Integration of G<sub>aA</sub>
s /In<sub>0.1</sub>
Ga<sub>0.9</sub>
As/AlAs resonance tunneling heterostructures into micro-electro-mechanical systems for sensor applications</title>
<author><name>CHENYANG XUE</name>
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<author><name>JIE HU</name>
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<author><name>JIJUN XIONG</name>
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<author><name>YONG CHEN</name>
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<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Aluminium arsenides</term>
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<term>Gallium Indium Arsenides Mixed</term>
<term>Gallium arsenides</term>
<term>Heterostructures</term>
<term>Negative differential conductivity</term>
<term>Piezoresistance</term>
<term>Potential barrier</term>
<term>Quantum wells</term>
<term>Resonant tunnelling</term>
<term>Signal-to-noise ratio</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Piézorésistance</term>
<term>Structure 2 barrières</term>
<term>Effet tunnel résonnant</term>
<term>Conductivité différentielle négative</term>
<term>Rapport signal bruit</term>
<term>Barrière potentiel</term>
<term>Gallium Indium Arséniure Mixte</term>
<term>Arséniure de gallium</term>
<term>Arséniure d'aluminium</term>
<term>Hétérostructure</term>
<term>Puits quantique</term>
<term>GaAs</term>
<term>AlAs</term>
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<front><div type="abstract" xml:lang="en">Double-barrier quantum-well resonant tunneling heterostructures of GaAs/In<sub>0.1</sub>
Ga<sub>0.9</sub>
As/AlAs have been used as pressure-sensing elements of designed micro-electro-mechanical systems. The static experiments have been conducted on the heterostructure, in both positive and negative differential resistance (PDR and NDR) regions, showing a piezoresistive coefficient of 3.85 x 10<sup>-9 </sup>
Pa<sup>-1</sup>
, which is about seven times larger than that of piezoresistive silicon devices. At the same time, the devices also provided an improved dynamic response (119.6 μV . g<sup>-1</sup>
V<sup>-1</sup>
) and signal-to-noise ratio (57 dB) in the NDR region.</div>
</front>
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<fA08 i1="01" i2="1" l="ENG"><s1>Integration of G<sub>aA</sub>
s /In<sub>0.1</sub>
Ga<sub>0.9</sub>
As/AlAs resonance tunneling heterostructures into micro-electro-mechanical systems for sensor applications</s1>
</fA08>
<fA11 i1="01" i2="1"><s1>CHENYANG XUE</s1>
</fA11>
<fA11 i1="02" i2="1"><s1>JIE HU</s1>
</fA11>
<fA11 i1="03" i2="1"><s1>WENDONG ZHANG</s1>
</fA11>
<fA11 i1="04" i2="1"><s1>BINZHEN ZHANG</s1>
</fA11>
<fA11 i1="05" i2="1"><s1>JIJUN XIONG</s1>
</fA11>
<fA11 i1="06" i2="1"><s1>YONG CHEN</s1>
</fA11>
<fA14 i1="01"><s1>Key Laboratory of Instrumentation Science & Dynamic Measurement (North University of China), Ministry of Education</s1>
<s2>030051 Taiyuan, Shanxi</s2>
<s3>CHN</s3>
<sZ>1 aut.</sZ>
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<fA14 i1="02"><s1>National Key Laboratory for Electronic Measurement Technology (North University of China</s1>
<s2>030051 Taiyuan, Shanxi</s2>
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<fA20><s1>462-467</s1>
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</fA66>
<fC01 i1="01" l="ENG"><s0>Double-barrier quantum-well resonant tunneling heterostructures of GaAs/In<sub>0.1</sub>
Ga<sub>0.9</sub>
As/AlAs have been used as pressure-sensing elements of designed micro-electro-mechanical systems. The static experiments have been conducted on the heterostructure, in both positive and negative differential resistance (PDR and NDR) regions, showing a piezoresistive coefficient of 3.85 x 10<sup>-9 </sup>
Pa<sup>-1</sup>
, which is about seven times larger than that of piezoresistive silicon devices. At the same time, the devices also provided an improved dynamic response (119.6 μV . g<sup>-1</sup>
V<sup>-1</sup>
) and signal-to-noise ratio (57 dB) in the NDR region.</s0>
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<fC02 i1="01" i2="3"><s0>001B70C63H</s0>
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<fC03 i1="01" i2="3" l="FRE"><s0>Piézorésistance</s0>
<s5>03</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG"><s0>Piezoresistance</s0>
<s5>03</s5>
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<fC03 i1="02" i2="X" l="FRE"><s0>Structure 2 barrières</s0>
<s5>04</s5>
</fC03>
<fC03 i1="02" i2="X" l="ENG"><s0>Double barrier structure</s0>
<s5>04</s5>
</fC03>
<fC03 i1="02" i2="X" l="SPA"><s0>Estructura 2 barrera</s0>
<s5>04</s5>
</fC03>
<fC03 i1="03" i2="3" l="FRE"><s0>Effet tunnel résonnant</s0>
<s5>05</s5>
</fC03>
<fC03 i1="03" i2="3" l="ENG"><s0>Resonant tunnelling</s0>
<s5>05</s5>
</fC03>
<fC03 i1="04" i2="X" l="FRE"><s0>Conductivité différentielle négative</s0>
<s5>06</s5>
</fC03>
<fC03 i1="04" i2="X" l="ENG"><s0>Negative differential conductivity</s0>
<s5>06</s5>
</fC03>
<fC03 i1="04" i2="X" l="SPA"><s0>Conductividad diferencial negativa</s0>
<s5>06</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE"><s0>Rapport signal bruit</s0>
<s5>07</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG"><s0>Signal-to-noise ratio</s0>
<s5>07</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE"><s0>Barrière potentiel</s0>
<s5>08</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG"><s0>Potential barrier</s0>
<s5>08</s5>
</fC03>
<fC03 i1="07" i2="X" l="FRE"><s0>Gallium Indium Arséniure Mixte</s0>
<s2>NC</s2>
<s2>NA</s2>
<s5>11</s5>
</fC03>
<fC03 i1="07" i2="X" l="ENG"><s0>Gallium Indium Arsenides Mixed</s0>
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<s5>11</s5>
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<s2>NA</s2>
<s5>11</s5>
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<s2>NK</s2>
<s5>15</s5>
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<fC03 i1="08" i2="3" l="ENG"><s0>Gallium arsenides</s0>
<s2>NK</s2>
<s5>15</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE"><s0>Arséniure d'aluminium</s0>
<s2>NK</s2>
<s5>16</s5>
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<fC03 i1="09" i2="3" l="ENG"><s0>Aluminium arsenides</s0>
<s2>NK</s2>
<s5>16</s5>
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<fC03 i1="10" i2="3" l="FRE"><s0>Hétérostructure</s0>
<s5>17</s5>
</fC03>
<fC03 i1="10" i2="3" l="ENG"><s0>Heterostructures</s0>
<s5>17</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE"><s0>Puits quantique</s0>
<s5>18</s5>
</fC03>
<fC03 i1="11" i2="3" l="ENG"><s0>Quantum wells</s0>
<s5>18</s5>
</fC03>
<fC03 i1="12" i2="3" l="FRE"><s0>GaAs</s0>
<s4>INC</s4>
<s5>52</s5>
</fC03>
<fC03 i1="13" i2="3" l="FRE"><s0>AlAs</s0>
<s4>INC</s4>
<s5>53</s5>
</fC03>
<fN21><s1>095</s1>
</fN21>
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